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  • EOS Product Family - Lam Research
    Wet wafer cleaning is used between chip-processing steps to remove yield-limiting residues and defects Continued device scaling, increasingly complex structures, and new materials bring additional defect removal challenges and also drive the need for increased wafer clean productivity
  • SAQUA Single Wafer System | Akrion Technologies
    The Saqua series of 300 mm single-wafer cleaning system utilizes single-wafer, precisely controlled spin-spray wet cleaning technology to remove a variety of post-metal etch particles and byproducts
  • Wet Processing, Post-CMP Clean - ACM Research, Inc.
    It is used to reduce particles, organic residues, and metallic contaminants from wafers without damaging the wafer surface and serves as a cleaning step following the CMP process used to manufacture high quality silicon (Si) and silicon carbide (SiC) substrates
  • Vacuum Chamber Cleaning Products for Faster PMs - Foamtec WCC
    UltraSOLV® Chamber Cleaning products enable Equipment Engineers in the semiconductor industry to quickly and thoroughly clean process by-product from a wide range of vacuum chambers
  • Chamber Clean Conditioning for III-V Etching - NNCI
    Used in case of diamond etch and CH4 H2 etches Clean Silicon wafers are used for convenience
  • Wet Chambers: Durable Design for Demanding Conditions | AVAC Industries
    Constructed from corrosion-resistant materials like stainless steel, our wet vacuum chambers stand up to harsh conditions and frequent cleaning In addition, specialized coatings and moisture management features help extend the lifespan of the equipment
  • ONE CHAMBER: CONDITIONING - plasmetrex. com
    Plasma chambers need a wet clean at regular intervals due deposit at the chamber wall (etch byproducts) Afterwards, the chamber has to be conditioned for routine production
  • How to Clean Plasma Chamber Walls: Wet Chemical vs. Dry Plasma Etching . . .
    Two primary methods are often employed to clean plasma chamber walls: wet chemical cleaning and dry plasma etching Each method has its own advantages and disadvantages, depending on the specific requirements and conditions of the manufacturing process
  • Wafer and Chamber Cleaning - Newport
    Compatible with multiple process gases ensuring the best clean based on material chemistries, RF and Microwave Plasma products provide an economical and green alternative to wet cleans which use acids and solvents that require special storage and disposal
  • Strip Clean Products | Photoresist Strip. Wet Clean. Plasma Bevel . . .
    To clear away particles, contaminants, residues, and other unwanted materials, wafer cleaning steps are inserted throughout manufacturing Wet processing technologies can be used for wafer cleaning as well as strip and etch applications





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